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Figure 7: Application idea of SELFA to CoW and FOWLP processes.
Conference (ECTC), pp. 1002-1008. integration,” 2019 IEEE 69th ECTC, multiple stacking fan-out package,”
2. L. England, D. Fisher, K. Rivera, B. pp. 1-6. 2018 IEEE 68th ECTC, pp. 337-342.
Guthrie, P-J. Kuo, C.-C. Lee, et al., 5. A. Jouve, L. Sanchez, C. Castan, M. 8. WonMyoung Ki, WonGeol Lee,
“Die-to-wafer (D2W) processing Laugier, E. Rolland, B. Montmayeul, IlBok Lee, InSu Mok, WonChul Do,
and reliability for 3D packaging of et al., “Self-assembly process Moh Kolbehdari, “Chip stackable,
advanced node logic,” 2019 IEEE for 3D die-to-wafer using direct ultra-thin, high-f lexibility 3D
69th ECTC, pp. 600-606. bonding: A step forward toward FOWLP (3D SWIFT® technology)
3. Y. S . K i m , S . K o d a m a , Y. process automatization,” 2019 IEEE for hetero-integrated advanced 3D
Mizushima, N. Araki1, C. Hsiao, 69th ECTC, pp. 225-234. WL-SiP,” 2018 IEEE 68th ECTC, pp.
H. Chang, et al., “Optimization of 6. F. C. Chen, M. F. Chen, W. C. Chiou, 580-586.
via bottom cleaning for bumpless D. C. H. Yu, “System on integrated 9. M. Lueck, A. Huffman, M. Butler,
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Biographies
Taro Shiojima is a Material Engineer in the R&D Institute at SEKISUI CHEMICAL CO., LTD., Osaka,
Japan. He engages in the development of materials for 3D packaging applications and holds a Master’s degree
in Material Engineering from the U. of Tokyo, Japan. Email taro.shiojima@sekisui.com
Munehiro Hatai is Chief Manager in the R&D institute at SEKISUI CHEMICAL CO., LTD., Osaka, Japan.
He has been developing semiconductor materials for 20 years and established the basic technology of SELFA.
He holds more than 40 Japanese patents.
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