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Going beyond traditional temporary bonding materials




        By Taro Shiojima, Munehiro Hatai, Minoru Inoue, Ryoichi Watanabe, Toshio Enami, Daihei Sugita
        [SEKISUI CHEMICAL CO., LTD.]
        H          igh-performance computing




                   (HPC) applications require
                   not only acceleration of
        processing performance speed, but also
        reduction of power consumption and a lower
        cost structure. To meet those requirements,
        3D packaging has recently been developed
        for multi-chip heterogeneous applications
        using through-silicon via (TSV), wafer on
        wafer (WoW), chip on wafer (CoW), and
        other technologies [1-5].
          It is required that the technologies
        noted above stack multi-chips in a
        package and bond the chips to chips,
        or to wafers, directly [6,7]. For these
        tech nologies, several tempora r y   Figure 1: Comparison between SELFA and the other temporary bonding materials.
        bonding materials are used to support
        the handling of wafers. The wafer is   carrier debonding methods of these   paper, several advantages of the new
        temporarily bonded on the carrier   temporary bonding materials is shown in     technology are discussed, such as low
        wafer and then bonded to the other   Figure 1. The mainstream applications   total thickness variation (TTV), thermal
        wafer after several treatments. After   of these carrier debonding methods are   resistance, no-residue, stress-free
        the previous steps, the carrier wafer is   mechanical, thermal and laser ablation.   releasing technology, and so on.
        released to fabricate the 3D packaging.   These debonding methods, however,
        These temporary bonding materials   have difficulties such as, risk of device   Design concept and technologies
        are needed to combine two conflicting   damage while debonding, thermal   SELFA is a double-sided adhesive
        requirements: 1) securely holding the   resistance, and high process cost—  tape that has two different acrylic
        wafer during processing, and 2) easily   including the cost of the debonding   adhesive layers. One side is a self-
        debonding the hard carrier during the   equipment. I n response to these   releasing adhesive layer attached to
        peeling off process. In recent years,   difficulties, more thermal-resistant and   a transparent hard carrier, such as
        these required performances have   easy-to-debond temporary bonding   a glass wafer, and the other side is
        been getting more difficult to achieve   materials have been developed.  an easy-to-peel adhesive layer that
        because of the increased complexity of   In this article “self-releasing adhesive   is attached to a device wafer. The
        the fabrication process. The chemical   tape (SELFA)” as a temporary bonding   tape  structure  is  shown  in  Figure
        and thermal stresses that temporary   material is introduced. The new tape has   2. The self-releasing adhesive layer
        bonding materials suffer are also getting   a unique releasing system: ultraviolet   is designed for carrier debonding
        larger. Additionally, these packages are   (UV)-triggered gas generation from   assisted  by  gas  generation.  Gas  is
        becoming thinner and thinner in order to   the tape. By using UV irradiation,   ge ne r at ed f rom t he a d hesive by
        stack more chips, so the wafer thickness   gas is generated from the adhesive   UV irradiation and raises the glass
        after back-grinding is becoming thinner.   layer and the glass carrier is released   carrier up so that the contacting area
        For example, achieving a thickness   automatically. This self-releasing   between the glass and the adhesive
        <30µm and completing the debonding   technology enables the debonding   layer dramatically decreases. By
        process are getting more difficult.   system to be very simple and suitable   de c re a si ng t he cont a ct i ng a re a ,
        These trends mean the difficulties of   for thinner wafers. By combining this   adhesion strength becomes lower
        using temporary bonding materials   gas generation technology and our   and the glass carrier can be detached
        are becoming more challenging and   adhesive design technologies, SELFA   free of stress. After glass carrier
        the requirements for new temporary   has chemical and thermal resistance   debonding, the adhesive tape can be
        bonding materials are growing [8].  up to 260°C. This means the new tape   smoothly removed from the wafer
          Several kinds of resins and tapes   overcomes errors in the processes   because the easy-to-peel adhesive was
        are used as a temporar y bonding   that traditional temporary bonding   specifically designed for controlling
        mater ial. The compar ison of the   materials cannot even survive. In this   adhesion strength under processing.


        44   Chip Scale Review   January  •  February  •  2021   [ChipScaleReview.com]
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