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Summary
                                                                                The investigation of an alternative
                                                                              approach to evaluate bond strength for
                                                                              actual die-level direct bonded samples was
                                                                              executed. The estimation of bond strength
                                                                              at the die level is crucial in assessing the
                                                                              reliability of advanced chiplets processed
                                                                              using D2W hybrid bonding. The use of the
                                                                              nanoindentation test made it possible to
                                                                              measure the in-plane uniformity of W2W
                                                                              bonding. Furthermore, it is now possible
                                                                              to measure the bonding strength of D2W
                                                                              samples, which could not be measured
                                                                              in the DCB test. Although the accuracy
                                                                              of the measurement is still a challenge,
                                                                              the measurement can accelerate the
                                                                              development of D2W hybrid bonding with a
        Figure 9: a) An SPM image of indentation; and b) An analysis image from the interface (thermal SiO 2 ).  precise bond strength value.
                                                                              Acknowledgments
                                                                                This article was presented at the 25th
                                                                              Electronics Packaging Technology
                                                                              Conference (EPTC 2023) and was edited for
                                                                              publication in Chip Scale Review. This work
                                                                              was supported by the “Intensive Support for
                                                                              Young Promising Researchers” project from
                                                                              the New Energy and Industrial Technology
                                                                              Development Organization (NEDO) and
                                                                              Strategic Research Seed Cultivation Project
                                                                              from KISTEC.

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                                                           2
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                                    2
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        0.58J/m  (Figure 10). Comparing the Center                                 73rd ECTC, Orlando, FL, USA, pp.
              2
        and Edge quartiles, there is a variation within                            694-698.
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