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in total. The metal areas are up to 6   dicing streets create issues where the   with metal, the blades’ self-sharpening
        microns in thickness and are of varying   mechanical saw dicing blades’ diamond   mechanism can be defeated, and the
        metal types in random locations in each   cutting surfaces are fully embedded with   blade begins to push into the silicon.
        reticle shot field. As metal levels and   metallization. High metallization filled   Metal interaction then surfaces, and
        structures increase in complexity, the   dicing streets create dicing issues with   can create damage during cutting.
        metal density increases. Increasing metal   metal loading of the dicing blades that   This damage creates yield issues and
        density creates more difficulty in loading   decrease process capabilities.  is compounded during production
        mechanical dicing blades, resulting   The dicing process typically involves   operations. Blade dressing increases, not
        in increases chipping, blade wear and   a self-sharpening dicing blade that   fully solving the problem, and therefore
        quality losses.                    constantly wears and exposes new   long term blade breakage and product
          The next challenge is process control   diamonds. In the case of blade loading   damage can result.
        in the wafer fabrication process. To
        incorporate process controls, the wafer
        streets are designed with features to enable
        the capability to do live probe, metal
        thickness measurements, as well as film
        measurements during processing. All these
        steps assure that the wafers built meet the
        electrical requirements needed, but they
        also require additional film, metal boxes
        for metrology measurements, as well as test
        pads to probe during processing. These are
        needed for each metal/fabrication layer that
        is placed, and they are stacked in the dicing
        street to save silicon for active die and
        maximize die per wafer increases.
          Figure 3 shows an example of testing
        pads’ locations on the die during wafer
        fabrication processing. These pads
        typically encompass all oxides, as well
        as each metal layer, with increasing
        thicknesses across the scribe street
        during manufacturing as a need for
        quality control. As metal layers and
        complexity increase, so do the number
        of test locations required to monitor
        and control wafer fabrication facilities.
        The structures are also complicated
        with moves to copper back end of line
        (BEOL) structures to increase device
        performance. Past work has been focused
        on optimizing mechanical dicing for use
        on aluminum pads and features, but the
        move to copper structures has required
        significant blade composition changes
        and process optimization to level set the
        dicing operations.
          The last key factor impacting dicing
        capabilities is die size interaction as
        shown in Figure 4. As die sizes increase,
        dicing street loading with metallization
        also increases as fab processing typically
        requires the same test structures on
        smaller versus larger devices. As a result,
        this constant component load requirement
        loads the entire step field layout with metal
        streets. This layout technique, in turn,
        causes entire dicing streets to be loaded
        with metallization in both the horizontal
        and vertical scribe locations. Metal-filled


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