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Figure 8: a) TSMC’s roadmaps for CoWoS (TSV-interposer) and CoWoS -L (reconstituted-interposer) [17]; b) Number of TSV-interposers vs. the size of the TSV-interposer.
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has been using CoWoS with the 1X
reticle (830mm ) for Xilinx, and with
2
2
the 2X reticle (1660mm ) for Nvidia.
For a 3X reticle (2500mm ), the yield
2
loss is too high so TSMC is going
to recommend a new chip-on-wafer-
on-substrate-LSI + RDL interposer
(CoWoS -L) as show n i n Figure
®
8a. Figure 8b shows the number of
physically possible TSV-interposers
vs. the size of the TSV-interposer on
a 300mm-wafer. The impact of TSV-
interposer size on yield loss per wafer
is obvious.
Figure 9 shows the replacement
®
of the TSV-interposer of CoWoS
by the LSI. Figure 9b shows the Si-
bridge embedded in an EMC with fan-
®
out RDLs (CoWoS -L). CoWoS -L
®
is a new interposer that consists of
at least an LSI (or Si-bridge) with or
without TSVs and integrated fan-out
(InFO) RDLs to form a reconstituted
interposer (RI). The small-size LSI
inherits all the attractive features of
the TSV-interposer by retaining sub-
micron Cu interconnects (RDLs),
TSVs, and embedded deep trench
capacitors (eDTCs) to ensure good E-Tec Interconnect AG, Mr. Pablo Rodriguez, Lengnau Switzerland
system performance. At the same time, Phone : +41 32 654 15 50, E-mail: p.rodriguez@e-tec.com
the small-size LSI avoids the issues
associated with the large-size TSV-
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