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Readying the supply chain for chiplets and


        heterogeneous IC packaging


        By Mike Kelly, Dave Hiner, Ruben Fuentes, Jonathan Micksch, Vineet Pancholi  [Amkor Technology, Inc.]
        P       roducts using heterogeneous   system-on-chip (SoC) flip-chip ball grid   DRAM memory (HBM), including




                integration (HI) and chiplets
                are here, they are in production,   array (FCBGA) packages, but with several    HBM2, HBM2e and HBM3. 2.5D TSV
                                                                              was one of the first modern heterogeneous
                                           key customizations.
        and the current trend is for more products   Currently, the packaging methodologies   integrations using a high-density module
        and more customers to develop and qualify   employed in both production and   to permit integration of the processor and
        their products at outsourced semiconductor   development encompass the following: 1)   DRAM in the package itself. The silicon-
        assembly and test suppliers (OSATs) and   2.5D through-silicon via (TSV) modules   based interposer uses a Cu backend
        foundry providers.                 relying on silicon interposers, i.e., 2.5D   foundry fabrication process, and this
          Combinations of processors and   TSV; 2) modules utilizing high-density   enables 1-2µm lines and spaces inside
        memories have been around for years,   fan-out (HDFO) multi-layer redistribution   the IC package. This has been critical to
        culminating at the high end with processors   layer (RDL) approaches; or 3) modules   enable a very wide parallel data base for
        and high-bandwidth memory (HBM) to   featuring bridges. These two-dimensional   HBM communication. In many ways, it
        address a fast-growing market for artificial   constructions can be used for discrete die   was this process development to enable
        intelligence (AI) algorithm training.   combinations as well as combinations of   2.5D TSV taking place in 2015-2018
        Now, the functional de-partitioning of   discrete die and 3D die stacks. The sections   that set the stage for a new class of high-
        die functions into chiplets is enabling a   below discuss this developing landscape,   density module-based products. These
        broader and more potent impact on future   starting first with the 2.5D TSV.  new approaches targeted the next wave
        designs. Chiplet approaches allow product                             of heterogeneous integrations as chiplets
        performance increases to continue at a cost   2.5D TSV silicon interposers  that were being designed and qualified in
        point that is still compelling. Total silicon   2.5D TSV has been in high-volume   just the last few years. In addition to the
        costs can be lower due to better yields for   manufacturing (HVM) at Amkor since   latest processing know-how developed
        smaller chiplets, and the opportunity to use   2017. The process flow begins with a full   to support the TSV reveal process, a new
        a mixture of silicon process nodes to further   “TSV-reveal” capability, starting with   class of ultra small Cu pillar bumps was
        optimize the cost of the silicon. Integrated   full thickness interposer wafers from   required to support bump pitches in the
        circuit (IC) packaging for heterogeneous   one of the foundries, thinning to reveal   40-55µm range. This requires advanced
        and chiplet approaches is more expensive,   the Cu TSVs, followed with an inorganic   plating tools and chemistries.
        but this rise in package cost is offset by   passivation step, under bump metallization   Many of the foundational technologies
        reduced total silicon expenses and favorable   (UBM) and interposer backside bumping.  noted above were used as is or extended
        time-to-market advantages.           This product space is dominated by   to intersect other high-density modules
          Moving to chiplets and HI implementations   high-performance processors working   such as HDFO and bridge-based product
        has required a new infrastructure to be   in combination with high-bandwidth   developments (Figure 1).
        established for IC and package design, IC
        and package fabrication, and electrical test.
        Design tools need to comprehend multiple
        ICs in 2D and 3D physical configuration,
        functional device electric test (E-Test)
        and higher power densities. IC packaging
        to support chiplets, and heterogeneous
        constructions, have been a primary focus
        for OSATs and foundries in recent years.
        Multi-die products must be integrated
        into one functional unit. Such integration
        is accomplished using higher-density
        integration approaches, namely wafer-scale
        (chip-on-wafer, CoW) high-density modules
        and high-density multi-chip modules
        (MCMs), or both. High-density modules are
        then attached to the IC package substrate in
        a production environment like the venerable   Figure 1: High-density module-based products.

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