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This may be the end of solder-based   2. I . H s u ,  e t  a l. ,  “ Fi n e - p i t c h   technology,”  IEEE  Trans.  On
        assembly. Direct bonding of copper      i ntercon nection and highly-      Electron Devices, vol. 64, no. 10,
        t o c op p e r h a s b e e n pu r s ue d for   integrated  assembly  packaging   pp. 4071–4077 (2017).
        more than a decade using advanced       with FOMIP (fan-out Mediatek    11. 3Di ncites. (2020), [Onli ne].
        t he r mo c o m p r e s s i o n  b o nd i n g   innovation package) technology,”   Available: https://www.3dincites.
        technologies. While the progress has    IEEE 70th Elec. Comp. and Tech.    c o m /20 20 / 1 0 / i f t l e - 4 6 4 -
        been outstanding, these assembly        Con f. ( ECTC), pp. 867– 872       t smcs-fa m ily- of-pa ck ag i ng-
        technologies tend to be slow and        (2020).                            technologies-are-built-on-3d-
        difficult for high-volume production.   3. W.- S . Kwo n , e t a l ., “ C o s t-  fabric/
        It is because of this reason that hybrid   effective and high-performance   12. L. Li, et al., “3D SiP with organic
        bond i ng be ca me a ve r y popu la r   28nm FPGA with new disruptive      interposer for ASIC and memory
        technology, originally invented by      s i l i c o n - l e ss  i n t e rc o n n e ct   integration,” (2016) IEEE 66th
        Ziptronix about 15 years ago, and       technology (SLIT),” International   ECTC, pp. 1445–1450.
        currently licensed to Xperi. Both       Symp. On Microelectronics, Inter.   13. T. Yamada, “Organic interposer
        TSMC  and Intel are pursuing  this      Microelectronics Assembly and      and embedded substrate,” in
        technology very aggressively showing    Packaging Soc. (2014), pp. 000     Pa c k a g i n g  S y m p.,  Kyo c e r a
        plans for 10µm pitch in the short       599– 000 605.                      America, Inc., 2015.
        term, and 1µm pitch within a decade.   4. JCET- “Embedded wafer-level ball   14. K. Oi, et al., “Development of
        Simultaneously, tool makers like        grid array technology,” (2019),    new 2.5D package with novel
        Applied Materials are developing the    http://jcet.workspacep5.webfoss.   integrated organic interposer
        necessary production tools.             com /uploads/eW LB%20 -%20         substrate with ultra-fine wiring
                                                Embedded%20Wafer-Level%20          and high-density bumps,” IEEE
        Summary                                 B a l l% 2 0 G r id% 2 0A r r ay % 2 0  64th ECTC, 2014, pp. 348–353.
          In summary, a historic shift from     Technology%20(FOWLP).pdf        15. J.  Kim,  et al., “Fan-out panel-
        transistor scaling to system scaling   5. C.  Zwenger,  R.  Huemoeller,  J.   level package with fine-pitch
        and integration has begun, leading to   Kim, D. Kim, W. Do, S. Seo,        pattern,” IEEE 68th ECTC, 2018,
        many other shifts such as glass panel   “Silicon wafer integrated fan-out   pp. 52–57.
        packaging, reaching 1µm lithography,    technology,” Additional Papers   16. D. Okamoto, et al., “Fabrication
        and IC assembly reaching 1µm pitch      and Presentations, vol. 2015, no.   and reliability demonstration
        withi n a decade — t wo histor ical     DPC, pp. 000 217–000 247 (2015).   of  3μm  diameter  photo  vias  at
        milestones. The current panel technology   6. J. K. Fang, M. L. Huang, H. J. Tu,   15μm pitch in thin photosensitive
        is based on laminate or build-up organic   W. L. Lu, P. Yang, “A production-  dielectric dry film for 2.5D glass
        technology, which has been known to be   worthy fan-out solution-ASE       interposer applications,” IEEE
        incapable of 1µm lithography. In parallel,   FoCoS chip last,” IEEE 70th   69th ECTC, pp. 2112–2116 (2019).
        IC assembly is being advanced with      ECTC, pp. 290–295 (2020).
        micro-bumps to 10µm pitch in the short   7.  H.-P. Pu, H. Kuo, C. Liu, C.   Biographies
        term, and later, towards a 1µm pitch    Douglas, “A  novel sub-micron   Rao R. Tummala is a distinguished
        using direct Cu-Cu bonding (also known   polymer re-distribution layer   emeritus Professor at the Georgia
        as hybrid bonding) to replace solder.   technology for advanced info   Institute of Technology, Atlanta, GA.
                                                packaging,” IEEE 68th ECTC, pp.   Prior to that, he was an IBM Fellow
        Acknowledgements                        45–51 (2018).                 and Director of Advanced Packaging
          The authors would like to thank the   8. R. Huemoeller, “Amkor’s slim   Technology Lab at IBM. He received
        members of the industry consortium      & swift package technology,”   his PhD in Materials Science and
        at the 3D Systems Packaging Research    A m k o r Te c h n o l o g y , S V P   Engineering at the U. of Illinois. Email
        Center, Georgia Institute of Technology,   Advanced Package Technology   rtummala@ece.gatech.edu.
        Atlanta, GA, USA for their support and   Develop & IP, 2015.            Madhavan Swaminathan is John
        technical guidance. The authors would   9.  R. Mahajan, et al., “Embedded   Pippin Chair in Microsystems Packaging
        also like to acknowledge the material and   multi-die interconnect bridge—a   and Director - 3D Systems Packaging
        process support from Taiyo Ink, TOK     localized, high-density multi-chip   Research Center (PRC) Georgia Institute
        and Atotech.                            packaging interconnect,” IEEE   of Technology, Atlanta, GA
                                                Trans. On Components, Packaging
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             newsroom/2021/10/introducing-   10. S. Hou , et al., “Wafer-level
             m1-pro-and-m1-max-the-most-        i nt eg r at ion of a n a dva nc e d
             powerful-chips-apple-has-ever-built/  logic-memory system through
                                                                           ®
                                                the second-generation CoWoS
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