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designed, no chloride ion was detected   Summary                        2. T. Yamada, M. Fukui, K. Terada,
        in the new resin, while more than    I n t h i s s t u d y, a new PI D wa s   M. Harazono, C. Reynolds, J.
        500ppm of chloride ion was included   developed based on the mater ial    Audet, et al., “Development of
        in the conventional resin. Once the   d e s i g n . T h e P I D h a s l o w C T E   a low CTE chip-scale package,”
        synthesis of the new resin without   (35-45ppm/°C) and high resolution    63rd Ele c. Comp. a nd Te ch.
        chloride ion was established, the new   (down to 6µm), which is beneficial for   Conf \. (ECTC), 2013, pp. 944-
        resin was applied to the new PID   multi-layer RDL formation. The PID     948.
        formulation, and a BHAST reliability   has high resistance to organic solvents   3. Y. Su z u k i, V. Su nd a r a m , R .
        analysis was conducted.            for f ine-pitch SAP, and no crack      Tummala, M. Arendt, L. Seongku,
                                           in  the PID was  formed by acetone     H. Hichiri, et al., ”Embedded
        Demonstration of BHAST reliability  dipping. As a result, very fine Cu line   trench redistribution layers (RDL)
          Test coupons for BHAST analysis   patterning of 2µm L/S was successfully   by excimer laser ablation and
        were L/S = 2/2µm comb-like Cu      demonstrated. A new synthetic method   surface planar processes,” 67th
        patterns, and they were fabricated   of acid modified acrylate resin with no   IEEE ECTC, 2017, pp. 884-889.
        on the f irst layer of the new PID   chloride impurity was developed. The   4. Y. Suzuki, J. Brune, R. Senczuk,
        by the same SAP processes as in    new PID  applies  the  new  resin, and   R. Pätzel, R. Furuya, F. Liu, et
        the previous section.  After the  Cu   BHAST evaluation showed more than   al.,  “Demonst ration  of  20μm
        patterning, the second layer of the new   300 hours of electrical reliability with   pitch micro-vias by excimer laser
        PID was laminated on top by vacuum   2µm L/S and a 5µm thin PID layer.    ablation in ultra-thin dry-film
        lamination and cured to complete the   The PID material has fine-patterning   polymer dielectrics for multi-
        test sample fabrication (Figure 9).  capabi l it y, a s wel l a s exc el le nt   layer RDL on glass interposers,”
          Fabricated test coupons were applied   reliability, therefore it is a highly   65th IEEE ECTC, 2015, pp. 922-
        to the reliability testing with the   beneficial dielectric material for high-  927.
        following conditions:              density packaging applications, such   5. Y. Otake, “Troubleshooting of
                                           as FOWLP, FOPLP, and high-density      p olyme r m at e rials,” Kogyo -
          •  P recond it ion i ng: 125°C/24h   package substrates.                Zairyo,  66 (8) Aug. 2018.
            ⇒ 85°C/168h ⇒ Reflow 260°C/                                         6. H. Kishi, T. Naitou, S. Matsuda,
            3 times; and                   Acknowledgements                       A. Mu r a k a m i, Y. Mu r aji, Y.
          •  B H A S T: 13 0 ° C , 8 5 % @ 5 V   T h e a u t ho r s w ou l d l i k e t o   N a k a g a w a ,  “ R el a t io n s h i p s
            (failure criteria : 1.0E+6 ohm)  acknowledge the technical support    between mechanical properties
                                           from Research Center for Three-        and nano-structures of DICY-
          F o r a  B H A S T  c h a m b e r ,  a   Dimensional Semiconductors, in   cured epoxy resins,” J. of the
        H A ST E ST  ®  M OD E L  P C - R 8 D   fabrication of test coupons for BHAST   Adhesion Soc. of Japan 41(3), 84-
        (Hirayama) was used, and for in situ   evaluations. The authors also thank   92, 2005-03-01.
        electrical resistance measurement,   Mitsui Mining & Smelting Co., Ltd.   7.  I. M. Barszczewska-Rybarek, A.
        a MIGR ATION TESTER MODEL          for its technical support in multi-layer   Korytkowska-Walach, M. Kurcok,
        MIG-8600B (IMV) was used. There    RDL structure fabrication.             G. Chladek, J. Kasperski,”DMA
        was no migration or electrical failure                                    analysis of the structure of cross-
        after 300 hours of BHAST condition.   References                          linked poly(methyl methacrylate)
        The cross-section analysis was then   1. K. Yamanaka, K. Kobayashi, K.    s,” Acta of Bioengineering and
        conducted, and the X-ray scanning      Hayashi, M.  Fukui,  “Materials,   Biomechanics Vol. 19, No. 1,
        electron microscope (X-SEM) images     processes, and performance of      2017, pp. 47-53.
        of 2µm L/S structures (Figure 10) also   h ig h-w i r i ng densit y bu ildup
        show no sign of Cu migration from the   s u b s t r a t e  w it h  u lt r a lo w -
        fine-pitch Cu wirings. Layer-to-layer   coefficient of thermal expansion,”
        BHAST reliability of a PID thickness   Comp. and Packaging Tech., IEEE
        of 5µm was also conducted and no       Trans. on, vol. 33, pp. 453461,
        failure after 300 hours was confirmed.  2010.


                       Biographies
                         Yuya Suzuki is a Marketing Manager of Taiyo America, a sister company of Taiyo Ink Mfg. Co., Ltd., San
                       Jose, CA. He has more than 10 years of experience in electronic materials for advanced IC packaging. Before
                       joining Taiyo Ink, he worked for Zeon Corporation, and the 3D Packaging Research Center at the Georgia
                       Institute of Technology. He has a PhD in Material Science from Georgia Institute of Technology. Email
                       YuyaS@Taiyo-America.com

                         Chihiro Funakoshi is an Engineer at Taiyo Ink Mfg. Co., Ltd., Saitama, Japan, where, since 1994, he has been
          developing polymer-based products for IC packaging. He received BS and MS degrees in Chemistry from Toyo U., Japan. He
          has authored more than 10 patents on polymer materials.


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